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M-Res

• Measurement system for semiconductor applications

• Non-contact resistance and resistivity measurement system for low resistivity samples and high resistivity samples

• Resistivity range from as low as 1mOhm up to 100kOhm

• Resistivity mapping capability

• Wafer diameter up to 300mm
• Wafer thickness up to 2mm

PV-R / PV-RT – PVR-HF / PVR-HF P/N

• Production Level In-Line Measurement

• Non-contact resistance and resistivity measurement system

• Resistance Range: 10Ohm – 200Ohm

• Application such as production monitoring or quality control of PV wafer

• Linien-Scan resistance variation monitoring

• Option with integrated wafer thickness variation monitoring

• Option of conductivity type monitoring

LCD-R

 

• in-line measurement system for production lines

• non-contact and non-destructive resistance measurement

• measurement range: 0,1Ohm – 2000Ohm

• application for manufacturing or quality control of coating process

 

 

MuTauScan

• Resistivity and charge transport properties mapping system

• For wafer size up to 150mm

• Minimum wafer thickness 0,5mm

• Non-contact and non-destructive method

• Resistivity from 105 – 1011 Ωcm

• Multi-function-detection head  - measuring both resistivity and charge transport without changing wafer position

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